Vacuum Coating Machine UHN-71P-3M-2 for Metal and Resistive Film Application

The vacuum spraying unit UVN-71P-3M-2 is designed for one-sided deposition of metallic and resistive films on polycor and satin substrates by magnetron vacuum sputtering method in the production of hybrid-film microchips. Maximum number of substrates with the size of 60x48x(0,5...1,0) mm 11 pcs. The unit has 3 magnetron evaporators. Time of achievement of residual pressure 4 x 10-4 Pa in the working chamber after opening of the high-vacuum shutter not more than 60 min. The unit provides: -regulation of rotation speed of the carousel with substrates in the range from 10 to 60 rpm; -heating of the carousel with substrates up to 300 °C; -control of the witness resistance of film sputtering on the substrates in the range from 0 to 100 kOhm; <ul> <li>- ion source power up to 200 W;</li> </ul>-power of the first magnetron evaporator of the first magnetron evaporator of adhesive material up to 2 kW; -power of the second magnetron vaporiser of the second magnetron evaporator of conductive material and the third magnetron evaporator of resistive material...