Oratoria 9-1 Vacuum Coating System for Advanced Thin Film Applications

Oratorium 9-1 vacuum deposition machine
Automated installation "Oratoria 9-1" electron-beam deposition of multilayer thin films of metals, alloys and dielectrics on ceramic and silicon wafers.
The main technological characteristics of the unit are:
-Size of ceramic wafers, mm - 60x48;
-Size of silicon wafers with diameter, mm - 100;
-Number of wafers on the planetary carousel, pcs - 4;
-Number of wafers on the spherical carousel, pcs - 40;
-Number of electron-beam evaporators, pcs - 2;
-Range of substrates heating temperature - 20-400 degrees Celsius;
-Rotation of the carousel is discrete (angle of discretion 90 degrees).
The unit provides:
-Heating of substrates up to the set temperature, control and maintenance of temperature in the process of layer sputtering;
-Automatic execution of the cycle of pumping the working chamber from the atmosphere to the specified vacuum;
-Control and automatic termination of film sputtering according to the set time or the set film thickness...