Electrode-Free Plasma RF Generator RPG-250 for Creating Low-Temperature Plasma

The electrodeless radio-frequency plasma generator is designed to create and maintain gas-discharge low-temperature plasma in the working volumes of vacuum process units in continuous mode and is used in: <ul> <li>- material sputtering in plasma of inert or chemically active gases</li> <li>ion and plasma chemical etching</li> <li>evaporation, with additional vapour ionisation</li> <li>plasma-stimulated vapour deposition</li> <li>ionic surface modification (oxidation, reduction, nitriding, carbidisation)</li> <li>ionic cleaning and assisted</li> <li>high-temperature annealing</li> </ul> The RPG-250 is equipped with: <ul> <li>- flat coil</li> <li>removable quartz glass shield to protect the working surface</li> <li>coaxial input with shank for connection to RF power source</li> </ul> *Operational Manual is available on request: LCMK.208.00.00.00.00.000 RE Radiofrequency Plasma Generator RPG-250 It is allowed to deliver the device as a part of the installation without packing.