Vacuum Coating System for Metallic Films Oratoria 29M - Ideal for Microelectronics

Vacuum spraying unit "Oratoria 29M", designed for application of metal films of aluminium, titanium, nickel, molybdenum on silicon wafers for microelectronics with diameter 76 mm. microelectronics with a diameter of 76 mm and 100 mm. The unit provides: -automatic pumping of the working chamber, airlock chamber wafer loading chamber, wafer sluice chamber, wafer unloading chamber and gas inlet into them; -automatic loading of wafers on the conveyor from the cassette and unloading of wafers into the cassette; -capacity of not less than 100 wafers per hour without taking into account the time of pumping time of sluice chambers; -time to reach residual pressure of 1.33 x 10-2 Pa in the working chamber from the moment of opening of the high-vacuum gate not more than 30 min; -regulation of conveyor speed in the range from 120 to 400 mm/min; -regulation of halogen lamp current KG 220-2000-2 plate heating in the range from 3 to 6 A; -regulation of argon pressure in the deposition zone in the range from 0.4 to 1.3 Pa; -operation of three magnetrons in the range of power each from 0.5 to 6.0 kW; -regulation ...